Thin film growth & modelling 3
09 June 2026
Conferences, Oral
GROM
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GROM 3
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15:50
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16:50
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Thin film growth & modelling 3
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Auditorium
GROM
15:50
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GROM3-O1-105
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Reactive sputtering of niobium disulfide thin films from niobium target using H2S as a reactive gas
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T.
Tomas
Nyberg (Uppsala)
16:10
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GROM3-O2-193
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Optimization of scandium oxide thin film deposition by magnetron sputtering
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N.
Nawel
Merghem (Nancy)
16:30
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GROM3-O3-085
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MAX based Ti-A-C (A = Si, Ge) thin films by High Power Impulse Magnetron Sputtering
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P.
Philipp
Dörflinger (Vienna)
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